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Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

David J. Beesley1,2,*, James Semple1,*, Lethy Krishnan Jagadamma3, Aram Amassian3, Martyn A. McLachlan4, Thomas D. Anthopoulos1 & John C. deMello2

 

ncomms4933-f1

ncomms4933

 

SAMをテンプレートにするタイプ。

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